|
Untitled Document
|
Endowed Scholarships
In cooperation with our generous donors, the IFMA Foundation has a number of endowed scholarships including:
Capital Chapter of IFMA - Barbara Pryor Scholarship
Houston Chapter of IFMA - Doug Underwood Scholarship
Houston Chapter of IFMA - George Graves Scholarship
IFMA Foundation - Lee Forrest Scholarship
Kansas City Chapter of IFMA Scholarship
Philadelphia Chapter of IFMA Scholarship
Silicon Valley Chapter of IFMA Certificate Program Scholarship
West Michigan Chapter of IFMA - Jim Hickey Memorial Scholarship
These generous donors have committed to supporting the FM profession year after year by ensuring funding is available for the future of FM – facility management and related profession college students.
Creating an Endowed Scholarship
The creation of the scholarship fund program is integral to the long-term investment in the future of the facility management profession. All endowed scholarship conform to the following:
Level 1: A minimum contribution of $50,000 (US) to the scholarship fund is required to award an annual $1,500 (US) scholarship. This contribution can be made over a three-year period; once the $50,000 requirement has been met, the sponsor may name the scholarship. At the following World Workplace the $1,500 scholarship will be awarded.
Registration and all travel expenses for the students will be combined and divided by the total number of scholarships awarded and all sponsors will pay the same amount. The maximum a sponsor will pay is $1,000. The Foundation will assume all costs beyond the $1,000 cap.
All scholarship sponsors and recipients receive appropriate recognition in IFMA publications, the IFMA Foundation web site and through press releases to the general media and trade press. Scholarship sponsors become part of the overall program by participating in the application review, scholarship recipient selection process and the scholarship awards program at WWP.
IFMA Foundation scholarships are awarded based on merit and certain applicant restrictions and/or qualification requirements may apply.
|
|
|
